Precision optical electron gun evaporation system is specially designed for the coating of precision optical thin film devices, and the design and overall structure of each system meet the requirements of optical thin film production process

?Vacuum index: Ultimate vacuum: 5.0E-5Pa (clean no-load, with umbrella stand, with protection plate, without substrate)
?Evacuation time: air to 3.0E-3Pa≦15min
?vacuum pressure rise rate: ≦0.5Pa/h (clean no-load, evacuated to the ultimate vacuum after the test)
?Baking index:Maximum temperature 300℃, multi-point temperature control, accurate temperature measurement, PID intelligent temperature control system, temperature controllable and adjustable.
?Optical real-time monitoring: The advanced optical monitoring system monitors the thickness of the substrate on the top of the E-beam umbrella in real time through the monitoring component installed in the cavity and feeds back to the system. The film forming system is controlled by feeding feedback information to achieve the purpose of real-time monitoring and correction of film thickness.
?Film forming system: 270°E type double electron gun evaporation source, equipped with baffles, water cooled crucible annular and multi-point crucible are available.IAD ion-assisted film formation improves the properties of optical film, improves the surface activity and adhesion of substrate, etc.